Short-wavelength infrared photodetector on Si employing strain-induced growth of very tall InAs nanowire arrays.

Research paper by Hyun Wook HW Shin, Sang Jun SJ Lee, Doo Gun DG Kim, Myung-Ho MH Bae, Jaeyeong J Heo, Kyoung Jin KJ Choi, Won Jun WJ Choi, Jeong-woo JW Choe, Jae Cheol JC Shin

Indexed on: 04 Jun '15Published on: 04 Jun '15Published in: Scientific Reports


One-dimensional crystal growth enables the epitaxial integration of III-V compound semiconductors onto a silicon (Si) substrate despite significant lattice mismatch. Here, we report a short-wavelength infrared (SWIR, 1.4-3 μm) photodetector that employs InAs nanowires (NWs) grown on Si. The wafer-scale epitaxial InAs NWs form on the Si substrate without a metal catalyst or pattern assistance; thus, the growth is free of metal-atom-induced contaminations, and is also cost-effective. InAs NW arrays with an average height of 50 μm provide excellent anti-reflective and light trapping properties over a wide wavelength range. The photodetector exhibits a peak detectivity of 1.9 × 10(8) cm · Hz(1/2)/W for the SWIR band at 77 K and operates at temperatures as high as 220 K. The SWIR photodetector on the Si platform demonstrated in this study is promising for future low-cost optical sensors and Si photonics.