Indexed on: 21 Jul '06Published on: 21 Jul '06Published in: Journal of Physical Chemistry B
The reaction of methoxy (OCH3) in the presence of NO2 is studied on a thin-film oxide of Mo(110) for its relevance to the alkane-assisted reduction of NO(x). Temperature-programmed reaction indicates that oxygen deposited by NO2 dissociation promotes formaldehyde evolution. This pathway is not observed in any appreciable amount for methoxy on the thin-film oxide of Mo(110), nor for the reaction of methoxy in the presence of NO or O2. No new intermediates, in particular those containing C-N bonds, are detected after NO2 is exposed to the surface containing methoxy. Furthermore, infrared spectra provide evidence that the presence of NO2 does not significantly perturb the methoxy intermediate. These results indicate that surface oxidation rather than intermolecular complexation is the most likely mechanism by which NO2 promotes the evolution of oxygenates. In addition, the presence of methoxy decreases the capacity of the Mo surface to reduce NO2. No N2 is produced, and molecular desorption predominates. There are also no NO(x) species present after heating to 500 K when NO2 reacts in the presence of methoxy, whereas monomeric NO and dinitrosyl are present when NO2 reacts alone. These results are discussed in the context of CH4-assisted NO(x) reduction.