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Highly Flexible and Porous Nanoparticle-Loaded Films for Dye Removal by Graphene Oxide–Fungus Interaction

Research paper by Liyuan Zhang, Xiaorui Li, Mengran Wang, Yingjie He, Liyuan Chai, Jianying Huang, Haiying Wang, Xianwen Wu, Yuekun Lai

Indexed on: 10 Dec '16Published on: 21 Nov '16Published in: ACS Applied Materials & Interfaces



Abstract

Highly flexible and porous films with the ability to load various nanoscale adsorbents are of particular importance in the purification field. Herein, we report the sustainable and large-scale fabrication of a porous and flexible hybrid film based on the graphene oxide/hyphae interaction at a relatively low temperature of 130 °C. Under identical conditions, such films cannot be constructed with solely graphene oxide or hyphae. Moreover, through the addition of nanoscale building blocks [e.g., nanoscale poly(m-phenylenediamine) (PmPD) adsorbents] in the interaction process, the nanoparticles can be in situ loaded into the film. According to FTIR and XPS analyses, the film formation mechanisms mainly involve redox and cross-linking reactions between graphene oxide and fungus hyphae. In a proof-of-concept study, a PmPD nanoparticle-loaded hybrid film was used as a superior key component to build a flow-through adsorption device that displayed a promising adsorption performance toward dye pollutants.

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