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Electrodeposition Behaviour of Cadmium Telluride from 1-ethyl-3-methylimidazolium Chloride Tetrafluoroborate Ionic Liquid

Research paper by S.-I. Hsiu, I.-W. Sun

Indexed on: 01 Oct '04Published on: 01 Oct '04Published in: Journal of Applied Electrochemistry



Abstract

Voltammetry at a glassy carbon electrode was used to study the electrochemical deposition of Cd–Te from the Lewis basic 1-ethyl-3-methylimidazolium chloride/tetrafluoroborate air-stable room temperature ionic liquid between 80 °C and 140 °C. Deposition of tellurium alone occurs through a four-electron reduction of Te(iv) to Te which could be further reduced to Te(-ii) at a more negative potential. The Cd–Te electrodeposits could be obtained by the underpotential deposition (UPD) of Cd on the deposited Te. The UPD of Cd on Te was, however, limited by a slow charge transfer rate. Samples of Cd–Te electrodeposits were prepared on tungsten and titanium substrates and characterized by energy dispersive spectroscope (EDS), scanning electron microscope (SEM), and X-ray powder diffraction (XRD). The results showed that an excess amount of Cd(ii) was required in order to prepare CdTe codeposits with a Cd/Te atomic ratio approached 1/1. The deposit composition was independent of the deposition potential within the Cd UPD range. Raising the deposition temperature increased the UPD rate of Cd and promoted the formation polycrystalline CdTe.