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Effects of surface treatment using aqua regia solution on the change of surface band bending of p-type GaN

Research paper by Jong Kyu Kim, Ki-Jeong Kim, Bongsoo Kim, Jae Nam Kim, Joon Seop Kwak, Yong Jo Park, Jong-Lam Lee

Indexed on: 01 Mar '01Published on: 01 Mar '01Published in: Journal of Electronic Materials



Abstract

Effects of surface treatment on the change of band bending at the surface of p-type GaN were studied using synchrotron radiation photoemission spectroscopy, and the results were used to interpret the reduction of contact resistivity by the surface treatment. The contact resistivity on p-type GaN decreased from (5.1±1.2)×10−1 to (9.3±3.5)×10−5Ω cm2 by the surface treatment using aqua regia prior to Pt deposition. Surface band bending was reduced by 0.58 eV and 0.87 eV after the surface treatments by HCl and aqua regia solutions, respectively. The atomic ratio of Ga/N decreased as the photoelectron detection angle was decreased, indicating that the surface oxide was mainly composed of Ga and O, GaOx, formed during high-temperature annealing for the generation of holes, and Ga vacancies, VGa, were produced below the GaOx layer. Consequently, the aqua regia treatment plays a role in removing GaOx formed on p-type GaN, leading to the shift of the Fermi level toward the energy levels of VGa located near the valence band edge. This causes the decrease of barrier height for the transport of holes, resulting in the good ohmic contacts to p-type GaN.