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Edge Channel Transport in InAs/GaSb Topological Insulating Phase

Research paper by Kyoichi Suzuki, Yuichi Harada, Koji Onomitsu, Koji Muraki

Indexed on: 18 Jun '13Published on: 18 Jun '13Published in: Physics - Mesoscopic Systems and Quantum Hall Effect



Abstract

Transport in InAs/GaSb heterostructures with different InAs layer thicknesses is studied using a six-terminal Hall bar geometry with a 2-$\mu$m edge channel length. For a sample with a 12-nm-thick InAs layer, non-local resistance measurements with various current/voltage contact con?gurations reveal that the transport is dominated by edge channels with negligible bulk contribution. Systematic non-local measurements allow us to extract the resistance of individual edge channels, revealing sharp resistance uctuations indicative of inelastic scattering. Our results show that the InAs/GaSb system can be tailored to have conducting edge channels while keeping a gap in the bulk region and provide a way of studying 2D topological insulators even when quantized transport is absent.