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Composition for antireflection coating

Imported: 23 Feb '17 | Published: 17 Feb '04

Yusuke Takano, Hatsuyuki Tanaka, Dong Han Lee

USPTO - Utility Patents

Abstract

A resist pattern having a good form without any T-top or round top is obtained by coating on a photoresist layer an anti-reflective coating composition containing at least (a) polyacrylic acid, (b) polyvinyl pyrrolidone, (c) C

nF

2n+1COOOH (wherein n represents an integer of 3 to 11) and (d) tetramethylammonium hydroxide to form an anti-reflective coating, and conducting patternwise exposure and development.

Claims

1. An anti-reflective coating composition comprising at least:

wherein the proportion of polyacrylic acid:polyvinyl pyrrolidone ranges from 99.5:0.5 to 50:50 (ratio by weight).

2. The anti-reflective coating composition according to claim 1, wherein the solvent in the anti-reflective coating composition is water.

3. A method of forming a resist pattern, which comprises applying the anti-reflective coating composition described in claim 1 onto a photoresist layer.

4. An anti-reflective coating composition comprising at least:

wherein the proportion of said components (a), (b), (c) and (d) is [(a)+(b)]:(c):(d)=1.0:1.0−7.0:0.1−1.0 (ratio by weight).

5. The anti-reflective coating composition according to claim 4, wherein the solvent in the anti-reflective coating composition is water.

6. A method of forming a resist pattern, which comprises applying the anti-reflective coating composition described in claim 4 onto a photoresist layer.